ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE

被引：26

作者：

KOMURO, M

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(82)90198-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：155 / 164

页数：10

共 11 条

[1] MECHANISM OF LIQUID-METAL ELECTRON AND ION SOURCES
GOMER, R
[J]. APPLIED PHYSICS, 1979, 19 (04): : 365 - 375
[2] FIELD-EMISSION LIQUID-METAL ION-SOURCE AND TRIODE ION GUN
KOMURO, M
KAWAKATSU, H
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 2642 - 2645
[3] KOMURO M, 1980, 4TH P S ION SOURC IO, P81
[4] KOMURO M, 1980, 27TH P IFES TOK, P189
[5] LOEFFLER KH, 1969, Z ANGEW PHYSIK, V27, P145
[6] Muller E W, 1969, FIELD ION MICROSCOPY
[7] FINE-FOCUS ION-BEAMS WITH FIELD-IONIZATION
ORLOFF, J
SWANSON, LW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 845 - 848
[8] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE
SELIGER, RL
WARD, JW
WANG, V
KUBENA, RL
[J]. APPLIED PHYSICS LETTERS, 1979, 34 (05) : 310 - 312
[9] ENERGY-DISTRIBUTION OF EHD EMITTED GOLD IONS
SUDRAUD, P
COLLIEX, C
VANDEWALLE, J
[J]. JOURNAL DE PHYSIQUE LETTRES, 1979, 40 (09): : L207 - L211
[10] SWANSON LW, 1979, SCANNING ELECTRON MI, V1, P45