EFFECTS OF OXYGEN ON THE GROWTH OF VAPOR-DEPOSITED ALUMINUM FILMS

被引：25

作者：

VERKERK, MJ

VANDERKOLK, GJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期

关键词：

D O I：

10.1116/1.573636

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3101 / 3105

页数：5

共 21 条

[1] FORMATION OF ALUMINUM THIN-FILMS IN THE PRESENCE OF OXYGEN AND NICKEL [J].

BARNA, A ;

BARNA, PB ;

RADNOCZI, G ;

REICHA, FM ;

TOTH, L .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 55 (02) :427-435

[2]

BARNA PB, 1983, VACUUM, V33, P25, DOI 10.1016/0042-207X(83)90523-7

[3]

BIJLANDER DM, 1984, PHYS REV B, V30, P2997

[4]

DHEURLE F, 1968, T METALL SOC AIME, V242, P502

[5] OXIDATION OF AL SINGLE-CRYSTAL SURFACES BY EXPOSURE TO O2 AND H2O [J].

EBERHARDT, W ;

KUNZ, C .

SURFACE SCIENCE, 1978, 75 (04) :709-720

[6] CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AND THERMALLY GROWN SILICON-NITRIDE FILMS [J].

HABRAKEN, FHPM ;

KUIPER, AET ;

VANOOSTROM, A ;

TAMMINGA, Y ;

THEETEN, JB .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :404-415

[7] THE INTERACTION OF OXYGEN WITH ALUMINUM - MAINLY ELLIPSOMETRIC ASPECTS [J].

HAYDEN, BE ;

WYROBISCH, W ;

OPPERMANN, W ;

HACHICHA, S ;

HOFMANN, P ;

BRADSHAW, AM .

SURFACE SCIENCE, 1981, 109 (01) :207-220

[8] WORK FUNCTION CHANGES DUE TO CHEMISORPTION OF WATER AND OXYGEN ON ALUMINUM [J].

HUBER, EE ;

KIRK, CT .

SURFACE SCIENCE, 1966, 5 (04) :447-&

[9]

JACOBS JWM, UNPUB J MICROSC OXFO

[10] ROOM-TEMPERATURE ADSORPTION OF WATER BY ALUMINUM THIN-FILMS [J].

KRUEGER, WH ;

POLLACK, SR .

SURFACE SCIENCE, 1972, 30 (02) :280-&

← 1 2 3 →