PHOTOFORMATION + PHOTOSENSITIZED FORMATION OF ISOBUTYRIL + PIVALIL ANION RADICALS

被引：11

作者：

HELLER, HC

机构：

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1964年 / 86卷 / 23期

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D O I：

10.1021/ja01077a070

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

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页码：5346 / &

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