INSITU ELLIPSOMETRY COMPARISON OF THE NUCLEATION AND GROWTH OF SPUTTERED AND GLOW-DISCHARGE A-SI-H

被引：12

作者：

COLLINS, RW

CAVESE, JM

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 10期

关键词：

D O I：

10.1063/1.339132

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4146 / 4153

页数：8

共 33 条

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