ATOMIC-LEVEL STRESS IN AN INHOMOGENEOUS SYSTEM

被引:229
作者
CHEUNG, KS
YIP, S
机构
[1] Department of Nuclear Engineering, Massachusetts Institute of Technology, Cambridge
关键词
D O I
10.1063/1.350186
中图分类号
O59 [应用物理学];
学科分类号
摘要
The distribution of local stress in an atomic system can be calculated from its mechanical definition. While this leads, for a homogeneous system, to an expression equivalent to that derived from the virial theorem (thermodynamic definition), when local inhomogeneities are present the equivalence can be demonstrated only in the sense of a volume average which effectively eliminates the inhomogeneities. Atomistic simulation results are presented to show that for a relaxed crystal with a planar free surface, the normal stress on each atomic plane parallel to the surface, when calculated according to the mechanical definition, vanishes uniformly as expected, whereas if the virial expression were applied the resulting stress distribution shows unphysical oscillations in the surface region.
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页码:5688 / 5690
页数:3
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