FREE-RADICALS FORMED BY REACTION OF SILANE WITH HYDROGEN-ATOMS IN RARE-GAS MATRICES AT VERY LOW-TEMPERATURES

被引:26
作者
NAKAMURA, K [1 ]
MASAKI, N [1 ]
SATO, S [1 ]
SHIMOKOSHI, K [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT CHEM,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1063/1.449018
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:4504 / 4510
页数:7
相关论文
共 14 条
[1]   AN ELECTRON SPIN RESONANCE STUDY OF SOME SILYL RADICALS [J].
BENNETT, SW ;
EABORN, C ;
HUDSON, A ;
JACKSON, RA ;
ROOT, KDJ .
JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1970, (02) :348-&
[2]   ANOMALIES IN STRUCTURAL CHEMISTRY OF SILICON [J].
BURGER, H .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION IN ENGLISH, 1973, 12 (06) :474-486
[3]   NUCLEOPHILIC DISPLACEMENT AT SILICON - RECENT DEVELOPMENTS AND MECHANISTIC IMPLICATIONS [J].
CORRIU, RJP ;
GUERIN, C .
ADVANCES IN ORGANOMETALLIC CHEMISTRY, 1982, 20 :265-312
[4]   REACTION OF H AND CH3 RADICALS WITH SILANES - EVIDENCE FOR SIH5 RADICAL [J].
GLASGOW, LC ;
OLBRICH, G ;
POTZINGER, P .
CHEMICAL PHYSICS LETTERS, 1972, 14 (04) :466-+
[5]   ELECTRON SPIN RESONANCE OF FREE RADICALS FORMED FROM GROUP-4 AND GROUP-5 HYDRIDES IN INERT MATRICES AT LOW TEMPERATURE [J].
JACKEL, GS ;
GORDY, W .
PHYSICAL REVIEW, 1968, 176 (02) :443-&
[6]   SILICON-29 HYPERFINE SPLITTING OF SIH3 RADICAL [J].
KATSU, T ;
YATSURUGI, Y ;
SATO, M ;
FUJITA, Y .
CHEMISTRY LETTERS, 1975, (04) :343-346
[7]   ELECTRON SPIN RESONANCE OF ORGANOSILYL RADICALS IN SOLUTION [J].
KRUSIC, PJ ;
KOCHI, JK .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1969, 91 (14) :3938-&
[8]   FREE ROTATION IN SOLIDS AT 4.2-DEGREES-K [J].
MCCONNELL, HM .
JOURNAL OF CHEMICAL PHYSICS, 1958, 29 (06) :1422-1422
[9]   ESR OF FREE RADICALS TRAPPED IN INERT MATRICES AT LOW TEMPERATURE - CH3 SIH3 GEH3 AND SNH3 [J].
MOREHOUSE, RL ;
CHRISTIANSEN, JJ ;
GORDY, W .
JOURNAL OF CHEMICAL PHYSICS, 1966, 45 (05) :1751-+
[10]  
MUTO H, 1980, J CHEM PHYS, V74, P4302