ATOMIC ROUGHNESS OF STEPS OF IR(001) LAYERS

被引：10

作者：

CHEN, CL ^{[1
]}

TSONG, TT ^{[1
]}

机构：

[1] ACAD SINICA,INST PHYS,TAIPEI 11529,TAIWAN

来源：

SURFACE SCIENCE | 1995年 / 336卷 / 1-2期

关键词：

FIELD EVAPORATION; FIELD ION MICROSCOPY; IRIDIUM; SURFACE DIFFUSION; SURFACE ROUGHENING; SURFACE STRUCTURE; MORPHOLOGY; ROUGHNESS; AND TOPOGRAPHY;

D O I：

10.1016/0039-6028(95)00562-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

With the field ion microscope, we have studied the energetics of atomic processes on the Ir(001) surface. We have found that lattice step atoms start to move along the [110] steps around 400 K. In thermal equilibrium, the top surface layer becomes a square with its four sides parallel to the [110] directions. At higher temperatures (500 K or higher), step atoms start to dissociate from edge sites, kink sites, ledge sites and other sites randomly so that one-dimensional step roughening occurs. By measuring the mean square deviation of the step heights at various temperatures, the kink energy for the Ir(001) steps can be derived to be 1.36 eV.

引用

页码：L735 / L740

页数：6

共 24 条

[1] CHEMISORPTION OF H, O, AND S ON NI(110) - GENERAL TRENDS [J].