MOSSBAUER AND ADHESION STUDY OF H+ IMPLANTED IRON FILMS ON INSULATORS

被引：7

作者：

CARBUCICCHIO, M

VALENTI, A

BATTAGLIN, G

MAZZOLDI, P

DALMASCHIO, R

机构：

[1] UNIV PADUA,DEPT PHYS,I-35100 PADUA,ITALY

[2] UNIV PADUA,INST IND CHEM,I-35100 PADUA,ITALY

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1986年 / 98卷 / 1-4期

关键词：

D O I：

10.1080/00337578608206093

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：21 / 26

页数：6

共 5 条

[1]

Battaglin G., 1984, Induced Defects in Insulators, P235

[2] SCATTERING TECHNIQUE FOR ELECTRON MOSSBAUER-SPECTROSCOPY [J].

CARBUCICCHIO, M .

NUCLEAR INSTRUMENTS & METHODS, 1977, 144 (02) :225-229

[3]

SOOD DK, 1984, MATER RES SOC S P, V27, P565

[4] SURFACE MODIFICATION USING MEV ION-BEAMS [J].

TOMBRELLO, TA .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :679-683

TRICKER, MJ ;

THORPE, RK ;

FREEMAN, JH ;

GARD, GA .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1976, 33 (02) :K97-K100