INTERFACE STATE EFFECTS IN PD-GATE MOS HYDROGEN SENSORS

被引:10
作者
EVANS, NJ [1 ]
PETTY, MC [1 ]
ROBERTS, GG [1 ]
机构
[1] UNIV DURHAM, DEPT APPL PHYS & ELECTR, DURHAM DH1 3LE, ENGLAND
来源
SENSORS AND ACTUATORS | 1986年 / 9卷 / 02期
关键词
D O I
10.1016/0250-6874(86)80018-X
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
引用
收藏
页码:165 / 175
页数:11
相关论文
共 24 条
[1]   DEPENDENCE OF INTERFACE STATE PROPERTIES OF ELECTROLYTE-SIO2-SI STRUCTURES ON PH [J].
BARABASH, PR ;
COBBOLD, RSC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (01) :102-108
[2]   SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES [J].
BERGLUND, CN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (10) :701-+
[3]   AUTOMATIC SYSTEM FOR BROAD-BAND COMPLEX-ADMITTANCE MEASUREMENTS ON MOS STRUCTURES [J].
BOUDRY, MR .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1978, 11 (03) :237-247
[4]   PD-SI SCHOTTKY DIODES AS HYDROGEN SENSING DEVICES - CAPACITANCE-VOLTAGE CHARACTERISTICS [J].
DILIGENTI, A ;
STAGI, M ;
CIUTI, V .
SOLID STATE COMMUNICATIONS, 1983, 45 (04) :347-350
[5]  
Goetzberger A., 1976, Critical Reviews in Solid State Sciences, V6, P1, DOI 10.1080/10408437608243548
[6]  
Johnson N. M., 1981, Insulating Films on Semiconductors. Proceedings of the Second International Conference, INFOS 81, P35
[7]   PD-THIN-SIO2-SI DIODE .1. ISOTHERMAL VARIATION OF H2-INDUCED INTERFACIAL TRAPPING STATES [J].
KERAMATI, B ;
ZEMEL, JN .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (02) :1091-1099
[8]   PD-THIN-SIO2-SI DIODE .2. THEORETICAL MODELING AND THE H-2 RESPONSE [J].
KERAMATI, B ;
ZEMEL, JN .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (02) :1100-1109
[9]   HYDROGEN SENSITIVE MOS-STRUCTURES .1. PRINCIPLES AND APPLICATIONS [J].
LUNDSTROM, I .
SENSORS AND ACTUATORS, 1981, 1 (04) :403-426
[10]   HYDROGEN SENSITIVE MOS-STRUCTURES .2. CHARACTERIZATION [J].
LUNDSTROM, I ;
SODERBERG, D .
SENSORS AND ACTUATORS, 1981, 2 (02) :105-138