EFFECT OF VERY THIN CR UNDERLAYERS ON THE MICROMAGNETIC STRUCTURE OF RF-SPUTTERED COCRTA THIN-FILMS

被引:10
作者
YEH, T [1 ]
SIVERTSEN, JM [1 ]
JUDY, JH [1 ]
机构
[1] UNIV MINNESOTA,DEPT ELECT ENGN,MINNEAPOLIS,MN 55455
关键词
D O I
10.1109/20.104457
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of very thin Cr underlayers on the initial susceptibilities and micromagnetic structures of RF sputtered CoCrTa thin films have been studied. It was found that the initial susceptibility of the CoCrTa films on thin Cr underlayers is a factor of 2.5 to 3.5 times smaller than the value of the CoCrTa film without any Cr underlayer. The micromagnetic images of these CoCrTa films on thin Cr underlayers also exhibit a different feature from the CoCrTa film deposited on substrate with no Cr underlayer. The thicker Cr underlayers, the finer micromagnetic images observed at both the as-deposited and the remanent state. It is very likely that the Cr underlayers induce stress in the CoCrTa/Cr double layer thin films, and through magnetoelastic interactions, the micromagnetic structures will be refined by the formation of barriers which pin the domain walls. This model could be the explanation of the low initial susceptibility and high in-plane coercivity in the RF sputtered thin CoCrTa/Cr double layer films. © 1990 IEEE
引用
收藏
页码:1590 / 1592
页数:3
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