LOW-TEMPERATURE ATMOSPHERIC-PRESSURE DISCHARGE PLASMA PROCESSING FOR VOLATILE ORGANIC-COMPOUNDS

被引：46

作者：

ODA, T

KUMADA, A

TANAKA, K

TAKAHASHI, T

MASUDA, S

机构：

[1] Department of Electrical Engineering, the University of Tokyo, Bunkyo-ku, Tokyo, 113

[2] Masuda Research Institute, Bunkyo-ku, Tokyo, 113, Kaneyasu-Bld. 6

来源：

JOURNAL OF ELECTROSTATICS | 1995年 / 35卷 / 01期

关键词：

D O I：

10.1016/0304-3886(95)00010-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The 1,000 ppm VOCs (volatile organic compounds) decomposition performance of SPCP (Surfaced Discharge Induced Plasma Chemical Processing) was studied relating to various carrier gas effects, plasma exposing methods and others in order to understand the decomposition mechanisms. In any carrier gas, a direct SPCP can decompose every VOC tested. The efficient decomposing carrier gases are oxygen, air and nitrogen in that order. However, when the SPCP treated gasses (air, nitrogen or oxygen) are mixed with contaminated gasses, oxygen seems be necessary to decompose VOCs. Four new halogenated (chloro-)organic materials are also tested as contaminants. The maximum decomposition for every contaminant is found to be more than 90% and the energy efficiency for each contaminant is roughly in the same order.

引用

页码：93 / 101

页数：9

共 4 条

[1]

Masuda, Non-Equilibrium Plasma Chemical Process PPCP and SPCP for Control of NOx, Sox and Other Gaseous Pollutants, Proc. 4th Int. Conf. ESP, pp. 615-623, (1990)

[2]

Masuda, Et al., A Ceramic-Biased Ozonizer Using High Frequency Surface Discharge, IEEE Trans., 24 IA, pp. 223-231, (1988)

[3]

Oda, Et al., Atmospheric Pressure Discharge Plasma Processing for Gaseous Air Contaminants, IEEE Trans., 29 IA, pp. 787-792, (1993)

[4]

Oda, Et al., Decomposition of Gaseous Organic Contaminants by Surface Discharge Induced Plasma Chemical Processing — SPCP, Conf. Rec. of IEEE/IAS 1992 Ann. Meeting, pp. 1570-1574, (1992)

← 1 →