THE THERMAL DENO(X) PROCESS - INFLUENCE OF PARTIAL PRESSURES AND TEMPERATURE

The effect of partial pressures of the reactants in the Thermal DeNO(x) process has been investigated in Row reactor experiments. The experiments were performed at atmospheric pressure for temperatures ranging from 923 to 1373 K. Initial concentrations were varied for NH3/NO (400/200, 1000/500, 2800/1400 ppm) and O-2 (0-50%). The data confirm earlier observations that in the temperature range revered, presence of O-2 is required in order for NO to be reduced by NH3. As the initial O-2 concentration is increased, the lower boundary for the process is shifted towards lower temperatures. The temperature range for NO reduction is widened, but the NO reduction potential decreases. At high oxygen concentrations the maximum NOx reduction is below 40%. Under these conditions, significant amounts of NO2 and N2O are formed. Two mechanisms for N2O formation in Thermal DeNO(x) have been identified. One is active at higher temperatures and low O-2 concentrations, while the other, which presumably involves NO2 as a precursor, is dominant at lower temperatures and high O-2 levels. The implications of the results for application of Thermal DeNO(x) in high pressure systems such as pressurized fluidized bed combustion is discussed. Comparisons of the experimental data with recent chemical kinetic models indicate that the detailed chemistry of the Thermal DeNO(x) system is not completely understood.