PRESSURE INCREASE OF THE ELECTRON-PHONON INTERACTION IN SUPERCONDUCTING HEXAGONAL SILICON

被引：28

作者：

DACOROGNA, MM ^{[1
]}

CHANG, KJ ^{[1
]}

COHEN, ML ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720

来源：

PHYSICAL REVIEW B | 1985年 / 32卷 / 03期

关键词：

D O I：

10.1103/PhysRevB.32.1853

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1853 / 1855

页数：3

共 14 条

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