TOTAL REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY - MATRIX REMOVAL PROCEDURES FOR TRACE ANALYSIS OF HIGH-PURITY SILICON, QUARTZ AND SULFURIC-ACID

被引:16
作者
REUS, U
机构
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D O I
10.1016/0584-8547(89)80061-8
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
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页码:533 / 541
页数:9
相关论文
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