DETERMINATION OF SILICON IN HIGH SILICON-NICKEL ALLOYS BY ICP-AES AFTER DISSOLVING IN NITRIC-HYDROFLUORIC ACIDS

被引：6

作者：

DANZAKI, Y

机构：

[1] Institute for Materials Research, Tohoku University, Miyagi, 980, 2-1-1, Katahira, Aoba, Sendai

来源：

FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1994年 / 348卷 / 12期

关键词：

D O I：

10.1007/BF01780987

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Silicon was determined by ICP-AES in high Si-Ni alloys dissolved in HNO3-HF. The interference by Si signals originating from the corrosion of the torch by HF was eliminated by keeping it almost constant. The relative standard deviation was within +/-1%.

引用

页码：836 / 836

页数：1