MICROSTRUCTURE AND TOPOGRAPHY OF VAPOR-DEPOSITED, SPUTTERED AND ANNEALED (111) PALLADIUM FILMS

被引：5

作者：

DIXIT, P

VOOK, RW

机构：

[1] Syracuse Univ, Syracuse, NY, USA, Syracuse Univ, Syracuse, NY, USA

来源：

APPLIED SURFACE SCIENCE | 1985年 / 24卷 / 02期

关键词：

This work was supported by the US Department of Energy; Office of Basic Energy Sciences; under contract number DE-AC02-83ER 45034 and grant number DE-FGO2-84ER 45139. The authors are indebted to Dr. S. Baba for preparing some of the samples;

D O I：

10.1016/0169-4332(85)90228-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：239 / 250

页数：12