MEASUREMENT OF CONCENTRATION PROFILES OF CU-2+ ION AND H+ ION NEAR A PLANE VERTICAL CATHODE BY 2-WAVELENGTH HOLOGRAPHIC-INTERFEROMETRY

被引:45
作者
DENPO, K
OKUMURA, T
FUKUNAKA, Y
KONDO, Y
机构
关键词
D O I
10.1149/1.2114030
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1145 / 1150
页数:6
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