DISPERSION CHANGES AND REACTIVITY OF PLATINUM ON SILICA DURING THERMAL-TREATMENT UNDER VACUUM AND AT LOW OXYGEN-PRESSURE

被引：17

作者：

ROMANOWSKI, W

LAMBER, R

机构：

[1] Polish Acad of Sciences, Inst of Low, Temperature & Structure, Research, Wroclaw, Pol, Polish Acad of Sciences, Inst of Low Temperature & Structure Research, Wroclaw, Pol

来源：

THIN SOLID FILMS | 1985年 / 127卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(85)90220-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：139 / 157

页数：19

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