JOINT NUCLEAR MICROPROBE AND SIMS STUDY OF MICROCIRCUIT METALLIZATION AND PASSIVATION LAYERS

被引：1

作者：

BREESE, MBH

COOKSON, JA

BISHOP, HE

GREENWOOD, S

机构：

[1] AEA Technol., Harwell Lab., Didcot

来源：

SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 1991年 / 6卷 / 05期

关键词：

D O I：

10.1088/0268-1242/6/5/002

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Both the nuclear microprobe and secondary ion mass spectrometry have the capability to give information on subsurface metallization and passivation layers, and they have been used at Harwell to study a microcircuit test structure. Results are given which both highlight the complementary nature of these two techniques in this particular case, and illustrate their respective advantages and drawbacks.

引用

页码：325 / 329

页数：5

共 6 条

[1] Jamieson DN, Grime GW, Watt F, The new Oxford scanning proton microprobe analytical facility, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 40-41, (1989)
[2] Watt F, Grime GW, (1987)
[3] Benninghoven A, Ruddennauer FG, Werner HW, (1987)
[4] Johansson SAE, Johansson TB, Nucl. Instrum. Methods, 137, 3, pp. 473-516, (1976)
[5] Chu WK, Mayer JW, Nicolet MA, (1978)
[6] Bishop HE, Greenwood SJ, Surf. Interf. Anal., 16, 1-12, pp. 70-76, (1990)

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