21-PS 0.1-MU-M CMOS DEVICES OPERATING AT ROOM-TEMPERATURE

被引:4
作者
IZAWA, T
WATANABE, K
KAWAMURA, S
机构
[1] Fujitsu Ltd, Kawasaki
关键词
Capacitance - Electric inverters - Electric resistance - Electrodes - Fabrication - Gates (transistor) - Ion implantation - LSI circuits - MOSFET devices - Semiconductor doping - Solid state oscillators;
D O I
10.1109/55.258006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-speed complementary metal-oxide semiconductor (CMOS)-inverter ring oscillators with the shortest gate length of 0.17 mum were fabricated by a conventional large-scale integrated (LSI) technology. The propagation delays were 21 ps/stage (2.0 V) at room temperature and 17 ps/stage (2.0 V) at 80 K. These results are the fastest records as reported for bulk CMOS devices as of today. The results were obtained by reducing effective drain junction capacitances with ''double-finger gates,'' and devices will probably be faster if the areas are completely proportionally reduced to the feature size. Though it is important for CMOS devices to increase drain currents, a silicidation technique for source and drain was not necessary for the tested devices to reduce series resistance.
引用
收藏
页码:533 / 535
页数:3
相关论文
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