MEASUREMENTS OF THE SECONDARY ION MASS-SPECTROMETRY ISOTOPE EFFECT

被引：17

作者：

SCHWARZ, SA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 03期

关键词：

D O I：

10.1116/1.574151

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：308 / 312

页数：5

共 18 条

[1]

FAHEY AJ, 1986, SECONDARY ION MASS S, V5, P170

[2] A DETERMINATION OF THE IONIZATION PROBABILITY FOR ALUMINUM SECONDARY ION EMISSION [J].

GARRETT, RF ;

MACDONALD, RJ ;

OCONNOR, DJ .

SURFACE SCIENCE, 1984, 138 (2-3) :432-448

[3] SECONDARY ION EMISSION BY NONADIABATIC DISSOCIATION OF NASCENT ION MOLECULES WITH ENERGIES DEPENDING ON SOLID COMPOSITION .1. MATHEMATICAL FORMULATION AND QUALITATIVE EXAMINATION OF A NEW EMISSION CONCEPTION FOR ME+ IONS [J].

GERHARD, W ;

PLOG, C .

ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1983, 54 (01) :59-70

[4] THE EFFECT OF OXYGEN ON THE SPUTTERING OF METASTABLE ATOMS AND IONS FROM BA METAL [J].

GRISCHKOWSKY, D ;

YU, ML ;

BALANT, AC .

SURFACE SCIENCE, 1983, 127 (02) :315-330

[5]

HAVETTE A, 1981, J MICROSC SPECT ELEC, V6, P169

[6]

KELLY R, 1980, SECONDARY ION MASS S, V2, P21

[7]

LORIN JC, 1982, SECONDARY ION MASS S, V3, P140

[8]

Oechsner H., 1982, SPRINGER SER CHEM PH, V19, P106

[9] MASS EFFECTS ON ANGULAR-DISTRIBUTION OF SPUTTERED ATOMS [J].

OLSON, RR ;

KING, ME ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3677-3683

[10] QUANTUM-MECHANICAL MODEL FOR IONIZATION AND EXCITATION OF ATOMS DURING SPUTTERING [J].

SCHROEER, JM ;

RHODIN, TN ;

BRADLEY, RC .

SURFACE SCIENCE, 1973, 34 (03) :571-580

← 1 2 →