FRICTION AND WEAR PROPERTIES OF CHEMOMECHANICALLY POLISHED DIAMOND FILMS

被引：25

作者：

GUPTA, BK

MALSHE, A

BHUSHAN, B

SUBRAMANIAM, VV

机构：

[1] Department of Mechanical Engineering, Ohio State University, Columbus, OH

来源：

JOURNAL OF TRIBOLOGY-TRANSACTIONS OF THE ASME | 1994年 / 116卷 / 03期

关键词：

D O I：

10.1115/1.2928862

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The role of surface roughness on the coefficient of friction and wear of polished CVD diamond films has been investigated. Diamond films grown on single crystal silicon (001) substrates by Hot Filament Chemical Vapor Deposition (HFCVD) process were polished by a chemomechanical process in which a diamond film was polished against another diamond film in the presence of a fused alkaline oxidizer at 320-degrees-C. Friction and wear properties of these polished films were measured at elevated temperatures and in the presence of various gaseous environments. The coefficient of friction of the polished diamond films was found to be about 0.09, which is very close to that of natural diamond (0.07). The wear rate of the mating alumina ball slid against a polished diamond film was also found to be comparable, when slid against natural diamond.

引用

页码：445 / 453

页数：9

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