SIMULTANEOUS EXPOSURE AND DEVELOPMENT TECHNIQUE FOR MAKING GRATINGS ON POSITIVE PHOTORESIST

被引:41
作者
TSANG, WT
WANG, S
机构
[1] UNIV CALIF,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
[2] UNIV CALIF,ELECTR RES LAB,BERKELEY,CA 94720
关键词
D O I
10.1063/1.1655151
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:196 / 199
页数:4
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