PASSIVATION COATINGS ON SILICON DEVICES

[1] ADAMS GE, 1973, 11TH P ANN C REL PHY, P95

[2] ADAMS JD, 1974, IEEE 1974 INTERCON

[3] BIBLIOGRAPHY ON MOSFET DEVICES [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (08) : 757 - 757

[4] AGAJANIAN AH, 1972, TR221559 IBM TECHN R

[5] ALTMAN L, 1973, ELECTRONICS, V46, P85

[6] GROWTH OF HYDROUS OXIDE-FILMS ON ALUMINUM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (10) : 1322 - 1328

[7] AMICK JA, 1970, CHEMICAL VAPOR DEPOS, P551

[8] ANOLICK ES, 1971, 9TH ANN P REL PHYS, P228

[9] WATER ADSORPTION IN CHEMICALLY VAPOR-DEPOSITED BOROSILICATE GLASS-FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (05) : 676 - 681

[10] OPTICAL MEASUREMENT OF FILM GROWTH ON SILICON AND GERMANIUM SURFACES IN ROOM AIR [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (10) : 619 - 622

[1] ADAMS GE, 1973, 11TH P ANN C REL PHY, P95

[2] ADAMS JD, 1974, IEEE 1974 INTERCON

[3] BIBLIOGRAPHY ON MOSFET DEVICES [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (08) : 757 - 757

[4] AGAJANIAN AH, 1972, TR221559 IBM TECHN R

[5] ALTMAN L, 1973, ELECTRONICS, V46, P85

[6] GROWTH OF HYDROUS OXIDE-FILMS ON ALUMINUM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (10) : 1322 - 1328

[7] AMICK JA, 1970, CHEMICAL VAPOR DEPOS, P551

[8] ANOLICK ES, 1971, 9TH ANN P REL PHYS, P228

[9] WATER ADSORPTION IN CHEMICALLY VAPOR-DEPOSITED BOROSILICATE GLASS-FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (05) : 676 - 681

[10] OPTICAL MEASUREMENT OF FILM GROWTH ON SILICON AND GERMANIUM SURFACES IN ROOM AIR [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (10) : 619 - 622