3RD-ORDER NONLINEAR OPTICAL SUSCEPTIBILITIES OF ELECTROCONDUCTIVE OXIDE THIN-FILMS

被引:35
作者
UEDA, N
KAWAZOE, H
WATANABE, Y
TAKATA, M
YAMANE, M
KUBODERA, K
机构
[1] NAGAOKA UNIV TECHNOL, DEPT ELECT ENGN, NAGAOKA 94954, JAPAN
[2] TOKYO INST TECHNOL, DEPT INORGAN MAT, MEGURO KU, TOKYO 152, JAPAN
[3] NIPPON TELEGRAPH & TEL PUBL CORP, OPTOELECTR LABS, ATSUGI, KANAGAWA 24301, JAPAN
关键词
D O I
10.1063/1.105420
中图分类号
O59 [应用物理学];
学科分类号
摘要
Third-order nonlinear optical susceptibilities (chi(3)) were estimated by third-harmonic generation for some electroconductive oxide thin films with wide band gaps (approximately 3.5 eV). Tin dioxide (SnO2) films showed the highest chi(3) as 3.8 X 10(-12) esu, which is comparable with that of polydiacethylene (PDA) casting films that possess conjugated pi-electron systems.
引用
收藏
页码:502 / 503
页数:2
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