SECONDARY ION YIELD MATRIX EFFECTS IN SIMS DEPTH PROFILES OF SI/GE MULTILAYERS

被引：20

作者：

GILLEN, G

PHELPS, JM

NELSON, RW

WILLIAMS, P

HUES, SM

机构：

[1] ARIZONA STATE UNIV, DEPT CHEM, TEMPE, AZ 85287 USA

[2] USN, RES LAB, DIV CHEM, WASHINGTON, DC 20375 USA

来源：

SURFACE AND INTERFACE ANALYSIS | 1989年 / 14卷 / 11期

关键词：

D O I：

10.1002/sia.740141114

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：771 / 780

页数：10

共 22 条

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