RF PLASMA NITRIDING OF TI-6A1-4V ALLOY

被引：19

作者：

RAVEH, A ^{[1
]}

AVNI, R ^{[1
]}

GRILL, A ^{[1
]}

机构：

[1] BEN GURION UNIV NEGEV,DEPT MAT ENGN,BEER SHEVA,ISRAEL

来源：

THIN SOLID FILMS | 1990年 / 186卷 / 02期

关键词：

D O I：

10.1016/0040-6090(90)90146-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium alloy (Ti6A14V) samples were nitrided in low pressure (7 mbar) inductive r.f. (0.5 MHz) plasmas of nitrogen or nitrogen-hydrogen. The nitriding time was 5 h and the temperatures of the samples during the nitriding process were 470±20°C and 420±20°C in the discharge and afterglow regions respectively. The effect of the sample location in the reactor and of the N2:H2 ratio in the gas mixture was studied. In the centre of the discharge region ε-Ti2N plus δ-TiN phases were formed on top of a solid solution of nitrogen in titanium, α-(Ti,N). In the afterglow region an α-(Ti, N) plus ε-Ti2N structure was obtained. The effects of nitrogen concentration in the gas mixture and of the sample location on the microhardness, lattice parameters, composition and structure of the nitrided films are presented and discussed. © 1990.

引用

页码：241 / 256

页数：16

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