E-BEAM INDUCED X-RAY MASK REPAIR WITH OPTIMIZED GAS NOZZLE GEOMETRY

被引：38

作者：

KOHLMANN, KT

THIEMANN, M

BRUNGER, WH

机构：

[1] Fraunhofer-Institut für Mikrostrukturtechnik (IMT), D-1000 Berlin 33

来源：

MICROELECTRONIC ENGINEERING | 1991年 / 13卷 / 1-4期

关键词：

Nozzles - Deposition rates - Photomasks - X ray lithography - Tungsten - Repair;

D O I：

10.1016/0167-9317(91)90093-S

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

For high throughput in the repair of clear defects on X-ray masks, it is very important to maximize the growth rate of the deposition process. In a nozzle arrangement, the growth rate is limited by the precursor gas flux. Using a special nozzle geometry, the deposition rate of tungsten was enhanced by a factor of more than 4 compared to a geometry commonly used. In addition, the deposits were characterized by their contrast in X-ray lithography. Their tungsten content was found to increase with increasing gas flux. Hence, the repair time of X-ray masks can be minimized by providing high gas flux.

引用

页码：279 / 282

页数：4