DEPENDENCE OF ELECTRICAL-PROPERTIES ON FILM THICKNESS IN PB(ZRXTI1-X)O3 THIN-FILMS PRODUCED BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

被引:190
作者
SAKASHITA, Y [1 ]
SEGAWA, H [1 ]
TOMINAGA, K [1 ]
OKADA, M [1 ]
机构
[1] CHUBU UNIV, FAC ENGN, KASUGAI, AICHI 487, JAPAN
基金
美国国家科学基金会; 美国国家卫生研究院;
关键词
D O I
10.1063/1.353936
中图分类号
O59 [应用物理学];
学科分类号
摘要
Strongly c-axis oriented Pb (ZrxTi1-x)O3 (PZT) thin films with tetragonal perovskite structure (0.45 < x < 0.52) were epitaxially grown on (100)Pt/(100) MgO substrates using metalorganic chemical vapor deposition. Film thickness could be varied by altering the growth time. The electrical properties of PZT thin films sharply change below a thickness of 0.5 mum: the dielectric constant and remanent polarization decrease while the coercive field increases. These phenomena are explained by a model in which a layer with low dielectric constant exists in series with the normal PZT layer. The origins of this layer are systematically studied and found to be the intrinsic stress produced by the coalescence of crystal grains.
引用
收藏
页码:7857 / 7863
页数:7
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