SURFACE IMPEDANCE MEASUREMENTS OF SUPERCONDUCTING V3SI FILMS BY A MICROSTRIP RESONATOR TECHNIQUE

被引：9

作者：

ANDREONE, A ^{[1
]}

CASSINESE, A ^{[1
]}

DICHIARA, A ^{[1
]}

SALLUZZO, M ^{[1
]}

VAGLIO, R ^{[1
]}

ATTANASIO, C ^{[1
]}

MARITATO, L ^{[1
]}

机构：

[1] UNIV SALERNO,DIPARTIMENTO FIS,I-84081 BARONISSI,ITALY

来源：

JOURNAL OF APPLIED PHYSICS | 1995年 / 78卷 / 03期

关键词：

D O I：

10.1063/1.360220

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Using a ring microstrip resonator technique, the surface impedance of V3Si sputtered films has been measured as a function of temperature and de and rf field amplitude. The results are analyzed in terms of the Bardeen-Cooper-Schrieffer theory and of a grain-boundary Josephson model, and discussed in the framework of the possible application of V3Si as a thin-film coating of superconducting rf cavities for particle accelerators. (C) 1995 American Institute of Physics.

引用

页码：1862 / 1865

页数：4

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