CHEMICAL VAPOR-DEPOSITION OF THIN SEMICONDUCTOR-FILMS FOR SOLAR-ENERGY CONVERSION

被引：56

作者：

SERAPHIN, BO ^{[1
]}

机构：

[1] UNIV ARIZONA,CTR OPT SCI,TUCSON,AZ 85721

来源：

关键词：

D O I：

10.1016/0040-6090(76)90626-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：87 / 94

页数：8

共 14 条

[1]

BLOEM J, 1973, J ELECTROCHEM SOC, V120, P180

[2]

CARTWRIGHT CH, 1939, PHYS REV A, V155, P1128

[3]

GEFFCKEN J, 1939, DRP736411 TECH REP

[4]

GUREV HS, 1975, 5TH P INT C CVD EL S, P667

[5]

GUREV HS, 1975, 3RD INT C THIN FILMS

[6]

GUREV HS, 1975, 7TH P NATL SAMPE TEC

[7]

GUREV HS, 147TH M EL SOC TOR

HAHN, RE ;

SERAPHIN, BO .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :905-908

[9]

MASTERSON KD, 1974, J OPT SOC AM, V64, P793

[10] SILICON OXYNITRIDE FILMS FROM NO-NH3-SIH4 REACTION [J].

RAND, MJ ;

ROBERTS, JF .