THE INFLUENCE OF MINOR ALLOYING ELEMENTS ON THE PASSIVATION BEHAVIOR OF IRON-CHROMIUM ALLOYS IN HCL

被引：31

作者：

GOETZ, R

LAURENT, J

LANDOLT, D

机构：

[1] Swiss Federal Inst of Technology,, Materials Dep, Lausanne, Switz, Swiss Federal Inst of Technology, Materials Dep, Lausanne, Switz

来源：

关键词：

PASSIVATION; -; SILICON; TUNGSTEN;

D O I：

10.1016/0010-938X(85)90057-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1115 / 1126

页数：12

共 27 条

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