ATOMICALLY RESOLVED IMAGES OF BISMUTH-FILMS ON MICA WITH AN ATOMIC FORCE MICROSCOPE

被引：14

作者：

WEISENHORN, AL

HENRIKSEN, PN

CHU, HT

RAMSIER, RD

RENEKER, DH

机构：

[1] UNIV AKRON,DEPT PHYS,AKRON,OH 44325

[2] UNIV AKRON,DEPT POLYMER SCI,AKRON,OH 44325

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 02期

关键词：

D O I：

10.1116/1.585190

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Bi(111) films grown on mica substrates and then exposed to air have been imaged with an atomic force microscope in 0.01 M HCl. By exposing the Bi(111) to air, layers of Bi oxide are readily formed, which can be removed by imaging in HCl. The images are atomically resolved and show two types of structure: large epitaxial areas of hexagonal structure with a spacing of 7.6 angstrom, and a few smaller regions with a spacing of 4.5 angstrom. The former agrees well with the (square-root 3 x square-root 3) R 30-degrees structure of an overlayer of atomic oxygen atoms adsorbed on Bi(111), and the latter with the uncovered Bi(111) surface.

引用

页码：1333 / 1335

页数：3

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