COPPER SUBTENSION DEPOSITION ON RUTHENIUM-TREATED PLATINUM-ELECTRODES

被引：13

作者：

QUIROZ, MA

GONZALEZ, I

VARGAS, H

MEAS, Y

LAMYPITARA, E

BARBIER, J

机构：

来源：

ELECTROCHIMICA ACTA | 1986年 / 31卷 / 04期

关键词：

D O I：

10.1016/0013-4686(86)80116-5

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：503 / 505

页数：3

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