THE IMPORTANCE OF ORGANOSILANE POLYMER PHOTOOXIDATION IN RESIST PATTERN FABRICATION

[1] BAN H, IN PRESS J POLYM PC

[2] HOFER DC, 1984, P SOC PHOTO-OPT INST, V469, P16, DOI 10.1117/12.941772

[3] MILLER RD, 1984, ACS SYM SER, V266, P293

[4] ORGANOSILANE HIGH POLYMERS - ELECTRONIC-SPECTRA AND PHOTODEGRADATION [J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1983, 21 (10) : 823 - 829

[5] POLYSILANE HIGH POLYMERS - MECHANISM OF PHOTODEGRADATION [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (09) : 2737 - 2742

[6] ORGANOSILANE HIGH POLYMERS - SYNTHESIS OF FORMABLE HOMOPOLYMERS [J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1983, 21 (10) : 819 - 822

[7] PREPARATION OF LONG-CHAIN POLY(METHYLPHENYLSILANE) [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1980, 198 (02) : C27 - C28

[8] THE POLYSILANE HIGH POLYMERS [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1986, 300 (1-2) : 327 - 346

[9] WEST R, 1983, COMPREHENSIVE ORGANO, V9, P365

[10] ZEIGLER JM, 1984, SPIE ADV RESIST TECH, V539, P166

[1] BAN H, IN PRESS J POLYM PC

[2] HOFER DC, 1984, P SOC PHOTO-OPT INST, V469, P16, DOI 10.1117/12.941772

[3] MILLER RD, 1984, ACS SYM SER, V266, P293

[4] ORGANOSILANE HIGH POLYMERS - ELECTRONIC-SPECTRA AND PHOTODEGRADATION [J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1983, 21 (10) : 823 - 829

[5] POLYSILANE HIGH POLYMERS - MECHANISM OF PHOTODEGRADATION [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (09) : 2737 - 2742

[6] ORGANOSILANE HIGH POLYMERS - SYNTHESIS OF FORMABLE HOMOPOLYMERS [J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1983, 21 (10) : 819 - 822

[7] PREPARATION OF LONG-CHAIN POLY(METHYLPHENYLSILANE) [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1980, 198 (02) : C27 - C28

[8] THE POLYSILANE HIGH POLYMERS [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1986, 300 (1-2) : 327 - 346

[9] WEST R, 1983, COMPREHENSIVE ORGANO, V9, P365

[10] ZEIGLER JM, 1984, SPIE ADV RESIST TECH, V539, P166