MAGNETOSTATIC FIELD INFLUENCE ON ELECTRODEPOSITION OF METAL-FILMS

被引：16

作者：

DANILYUK, AL

KURMASHEV, VI

MATYUSHKOV, AL

机构：

[1] Minsk Radioengineering Institute, Minsk, 220600

来源：

THIN SOLID FILMS | 1990年 / 189卷 / 02期

关键词：

D O I：

10.1016/0040-6090(90)90453-K

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The relationship between the influence of a constant magnetic field with induction 0.05-0.19T and electrodeposition of copper, nickel and tin films with respect to electrochemical behaviour and mixed kinetics was found to exhibit an oscillating behaviour. A qualitative model is suggested which interprets the discovered relationship within the limits of the theory of magnetic spin effects. The model is based on the assumptions about the character of spin conversion of the system of three paramagnetic particles at chemisorption-an aquated ion, an adsorption centre, and an unpaired conduction electron. © 1990.

引用

页码：247 / 255

页数：9

共 11 条

[1] THE INDUCTION OF QUANTUM BEATS BY HYPERFINE INTERACTIONS IN RADICAL-ION PAIR RECOMBINATION [J].