HESSIAN BIASED FORCE-FIELD FOR POLYSILANE POLYMERS

被引:11
作者
MUSGRAVE, CB [1 ]
DASGUPTA, S [1 ]
GODDARD, WA [1 ]
机构
[1] CALTECH,CTR MAT & PROC SIMULAT,BECKMAN INST 13974,DIV CHEM & CHEM ENGN CN9041,PASADENA,CA 91125
关键词
D O I
10.1021/j100036a004
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report a force field (FF) suitable for molecular dynamics simulations of polysilane polymers. This FF, denoted MSXX, was developed using the Hessian biased method to describe accurately the vibrational states, the ab initio torsional potential energy surface, and the nb initio electrostatic charges of polysilane oligomers. This MSXX FF was used to calculate various spectroscopic and mechanical properties of the polysilane crystal. Stress-strain curves and surface energies are reported. Gibbs molecular dynamics calculations (Nose, Rahman-Parrinello) were used to predict various materials properties at higher temperatures. Phonon dispersion curves and elastic constants were calculated at various temperatures. Although this polymer is of increasing industrial interest, we could find no experimental data with which to compare these predictions.
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页码:13321 / 13333
页数:13
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