MECHANISMS OF BARRIER FORMATION IN SCHOTTKY CONTACTS - METAL-INDUCED SURFACE AND INTERFACE STATES

被引:20
作者
MONCH, W
机构
[1] Laboratorium für Festkörperphysik und Sonderforschungsbereich 254, Universität Duisburg
关键词
D O I
10.1016/0169-4332(89)90045-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Metal as well as nonmetal adatoms are generally inducing surface states and dipoles on semiconductor surfaces. Both effects may be understood in a bond picture, which describes adatom-substrate bonds in a surface-molecule model, and in the band picture, which considers the tailing of adatom electron wave functions into the semiconductor. These two approaches have in common a charge transfer between the adatoms and the substrate which may be modeled by the difference of their electronegativities. The same concept may be applied to metal-semiconductor contacts. In that energy range, where the metal conduction band overlaps the semiconductor band gap, metal electron wave functions are tailing into the semiconductor and a charge transfer occurs between the respective continuum of metal-induced gap states (MIGS) and the metal. Deviations of barrier heights in Schottky contacts from what is predicted by that MIGS-and-electronegativity concept are attributed to fabrication-induced defects of donor type or interface strain. © 1989.
引用
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页码:128 / 138
页数:11
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