RATIONALE FOR THE APPLICATION OF THIN, CONTINUOUS METAL-FILMS IN HIGH MAGNIFICATION ELECTRON-MICROSCOPY

被引：32

作者：

PETERS, KR

机构：

来源：

关键词：

D O I：

10.1111/j.1365-2818.1986.tb02734.x

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：25 / 34

页数：10

共 42 条

BASSETT, GA .

PHILOSOPHICAL MAGAZINE, 1958, 3 (33) :1042-&

[2] TEMPERATURE CHANGES IN THIN METAL FILMS DURING VAPOR DEPOSITION [J].

BELOUS, MV ;

WAYMAN, CM .

BRANDES, J ;

WETTER, C .

[4]

Broers A.N., 1975, Scanning Electron Microsc, V1975, P233

[5]

Chopra K.L, 1969, THIN FILM PHENOMENA

CHOPRA, KL ;

RANDLETT, MR .

[7] GROWTH OF SPUTTERED VS EVAPORATED METAL FILMS [J].

CHOPRA, KL .

[8]

ECHLIN P, 1972, SCANNING ELECTRON MI, V1, P137

[9] IDEALIZED SPATIAL EMISSION DISTRIBUTION OF SECONDARY ELECTRONS [J].

EVERHART, TE ;

CHUNG, MS .

[10]

Glang R., 1970, HDB THIN FILM TECHNO, P3