RF PRODUCTION OF HIGH-DENSITY PLASMAS FOR ACCELERATORS

被引：38

作者：

CHEN, FF

机构：

来源：

关键词：

D O I：

10.1017/S0263034600007539

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：551 / 559

页数：9

共 7 条

[1] SOME FEATURES OF RF EXCITED FULLY IONIZED LOW-PRESSURE ARGON PLASMA
BOSWELL, R
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PRYTZ, A
BOUCHOULE, A
RANSON, P
[J]. PHYSICS LETTERS A, 1982, 91 (04) : 163 - 166
[2] BOSWELL RW, 1984, PLASMA PHYS CONTR F, V26, P1147, DOI 10.1088/0741-3335/26/10/001
[3] CHEN FF, 1985, ANUPRLIR8512 AUSTR N
[4] CHEN FF, 1981, TRWII3552 REP TASK
[5] CHEN FF, 1989, HDB PLASMA PHYSICS, V4
[6] CHEN FF, 1984, INTRO PLASMA PHYSICS, P270
[7] RADIO-FREQUENCY PLUGGING OF A HIGH-DENSITY PLASMA
WATARI, T
HATORI, T
KUMAZAWA, R
HIDEKUMA, S
AOKI, T
KAWAMOTO, T
INUTAKE, M
HIROE, S
NISHIZAWA, A
ADATI, K
SATO, T
WATANABE, T
OBAYASHI, H
TAKAYAMA, K
[J]. PHYSICS OF FLUIDS, 1978, 21 (11) : 2076 - 2081