HIGH-EFFICIENCY KRF EXCIMER LASER

被引：66

作者：

BHAUMIK, ML ^{[1
]}

BRADFORD, RS ^{[1
]}

AULT, ER ^{[1
]}

机构：

[1] NORTHROP RES & TECHNOL CTR,HAWTHORNE,CA 90250

来源：

APPLIED PHYSICS LETTERS | 1976年 / 28卷 / 01期

关键词：

D O I：

10.1063/1.88566

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：23 / 24

页数：2

共 13 条

[1] TABLE-TOP AR-N2 LASER [J].

AULT, ER .

APPLIED PHYSICS LETTERS, 1975, 26 (11) :619-620

[2] HIGH-POWER AR-N2 TRANSFER LASER AT 3577 A [J].

AULT, ER ;

BHAUMIK, ML ;

OLSON, NT .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1974, QE10 (08) :624-626

[3] HIGH-POWER XENON FLUORIDE LASER [J].

AULT, ER ;

BRADFORD, RS ;

BHAUMIK, ML .

APPLIED PHYSICS LETTERS, 1975, 27 (07) :413-415

[4]

BERGER MJ, 1967, 1133 NATL AC SCI PUB, pCH10

[5] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

[6]

KOLTS JH, COMMUNICATION

[7] VACUUM ULTRAVIOLET ABSORPTION SPECTRUM AND DIPOLE MOMENT OF NITROGEN TRIFLUORIDE [J].

LAPAGLIA, S ;

DUNCAN, ABF .

JOURNAL OF CHEMICAL PHYSICS, 1961, 34 (03) :1003-&

[8]

LORENTS DC, UNPUBLISHED

[9]

PIPER LPS, TO BE PUBLISHED

[10] STIMULATED EMISSION AT 281.8 NM FROM XEBR [J].

SEARLES, SK ;

HART, GA .

APPLIED PHYSICS LETTERS, 1975, 27 (04) :243-245

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