REDUCTION OF ION SPUTTERING YIELD BY SPECIAL SURFACE MICROTOPOGRAPHY

被引:43
作者
ZIEGLER, JF
CUOMO, JJ
ROTH, J
机构
[1] IBM CORP,YORKTOWN HTS,NY 10598
[2] MAX PLANCK INST PLASMA PHYS,D-8046 GARCHING,FED REP GER
关键词
D O I
10.1063/1.89380
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:268 / 271
页数:4
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