TEMPERATURE DEPENDENCY OF RESISTANCE OF THIN METAL FILMS

被引：26

作者：

FELDMAN, C

机构：

来源：

关键词：

D O I：

10.1063/1.1702665

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1710 / &

共 21 条

BELSER, RB ;

HICKLIN, WH .

BLANCLAPIERRE, A ;

NIFONTOFF, N .

JOURNAL DE PHYSIQUE ET LE RADIUM, 1956, 17 (03) :230-235

[3] TECHNIQUES FOR MAKING ELECTRICAL CONTACTS TO THIN FILMS [J].

FELDMAN, C ;

DAVIES, L ;

CULVER, HE .

[4]

FELDMAN C, 1952, CR HEBD ACAD SCI, V235, P414

[5]

FELDMAN C, 1955, ANN PHYS, V10, P435

GORTER, CJ .

PHYSICA, 1951, 17 (08) :777-780

[7] VARIATION IN THE TEMPERATURE DERIVATIVE OF RESISTIVITY [J].

KNORR, TG ;

HOFFMAN, RW .

Lovell, ACB .

[9]

MINN SS, 1960, J RECH CENTRE NAT RE, V51, P131

[10]

MOSTOVETCH N, 1951, SEMICONDUCTING MATER, P260