OXIDATION OF THIN CHROMIUM FILMS

被引:15
作者
HOPE, GA [1 ]
RITCHIE, IM [1 ]
机构
[1] UNIV WESTERN AUSTRALIA,DEPT PHYS & INORG CHEM,NEDLANDS,AUSTRALIA
关键词
D O I
10.1016/0040-6090(76)90145-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:111 / 114
页数:4
相关论文
共 5 条
[1]   EFFECT ON A TARNISHING REACTION OF AN ELECTRIC FIELD ACROSS GROWING PRODUCT LAYER [J].
ANDERSON, JR ;
RITCHIE, IM .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1967, 299 (1458) :371-+
[2]   EFFECT OF PRESSURE CHANGES ON OXIDATION RATE OF ALUMINUM IN TEMPERATURE-RANGE 323-673 K [J].
HUNT, GL ;
RITCHIE, IM .
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1972, 68 (08) :1413-&
[3]  
Kubaschewski O., 1967, OXIDATION METALS ALL
[4]   PREPARATION AND PROPERTIES OF CHROMIUM FILMS [J].
MILGRAM, AA ;
LU, CS .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (06) :2851-+
[5]   EFFECT OF AN ELECTRIC FIELD ON OXIDATION RATE OF NICKEL BETWEEN 250 AND 380 DEGREES C [J].
RITCHIE, IM ;
SCOTT, GH ;
FENSHAM, PJ .
SURFACE SCIENCE, 1970, 19 (01) :230-+