SYNCHROTRON RADIATION ASSISTED DEPOSITION OF ALUMINUM-OXIDE FROM CONDENSED LAYERS OF TRIMETHYLALUMINUM AND WATER AT 78-K

Spectroscopic evidence is presented that shows that synchrotron irradiation of trimethylaluminum (TMA) and water at 78 K on a silver substrate produces pure layers of aluminum oxide. Near-edge x-ray absorption fine structure and core level photoelectron spectroscopies are used to characterize the Al2O3 layer, which was 30 angstrom thick. The carbon component in the alkylaluminum precursor is completely removed during irradiation as volatile methane product. In the absence of synchrotron radiation the molecular precursors show evidence of some interactions within the solid, but upon warming to ambient temperatures (260 K) the adsorbed layers desorb from the substrate.