EFFECT OF THE DISLOCATION DENSITY ON MINORITY-CARRIER LIFETIME IN MOLECULAR-BEAM EPITAXIAL HGCDTE

被引:33
作者
SHIN, SH
ARIAS, JM
ZANDIAN, M
PASKO, JG
DEWAMES, RE
机构
[1] Rockwell International Science Center, Thousand Oaks
关键词
D O I
10.1063/1.105895
中图分类号
O59 [应用物理学];
学科分类号
摘要
The photoconductive minority-carrier lifetime has been measured as a function of temperature and etch-pit density in n-type HgCdTe grown by molecular beam epitaxy with a composition range x = 0.22-0.23 to determine the limiting recombination mechanisms, particularly those related to dislocation density. In the extrinsic region at temperatures T < 77 K, the minority-carrier lifetime is limited by Shockley-Read recombination. Strong correlation between minority-carrier lifetime and dislocation density is observed.
引用
收藏
页码:2718 / 2720
页数:3
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