MOLECULAR-BEAM EPITAXY OF MNAS THIN-FILMS ON GAAS

被引:139
作者
TANAKA, M [1 ]
HARBISON, JP [1 ]
SANDS, T [1 ]
CHEEKS, TL [1 ]
KERAMIDAS, VG [1 ]
ROTHBERG, GM [1 ]
机构
[1] STEVENS INST TECHNOL,HOBOKEN,NJ 07030
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 02期
关键词
D O I
10.1116/1.587095
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have successfully grown single-crystalline ferromagnetic MnAs thin films on (001) GaAs substrates by molecular beam epitaxy. By reflection high energy electron diffraction and x-ray measurements, the growth direction of the MnAs thin films was found to be [1100BAR] on (001) GaAs, and the epitaxial relationship was [0001] MnAs //[110BAR] GaAs and [1120BAR] MnAs //[110] GaAs. Magnetization measurements at room temperature have revealed that the epitaxial MnAs thin films have strong magnetic anisotropy, and that the easy magnetization direction is in-plane, along the [1120BAR] axis of the MnAs thin films which is parallel to the [110] axis of the GaAs substrate, with almost perfect square hysteresis loops, relatively high remanent magnetization, and low coercive field.
引用
收藏
页码:1091 / 1094
页数:4
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