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BROAD-BEAM ELECTRON SOURCE
被引:7
作者
:
KAUFMAN, HR
论文数:
0
引用数:
0
h-index:
0
机构:
COMMONWEALTH SCI CORP,ALEXANDRIA,VA 22314
KAUFMAN, HR
ROBINSON, RS
论文数:
0
引用数:
0
h-index:
0
机构:
COMMONWEALTH SCI CORP,ALEXANDRIA,VA 22314
ROBINSON, RS
机构
:
[1]
COMMONWEALTH SCI CORP,ALEXANDRIA,VA 22314
[2]
COLORADO STATE UNIV,DEPT PHYS,FT COLLINS,CO 80523
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
|
1985年
/ 3卷
/ 04期
关键词
:
D O I
:
10.1116/1.573377
中图分类号
:
TB3 [工程材料学];
学科分类号
:
0805 ;
080502 ;
摘要
:
引用
收藏
页码:1774 / 1778
页数:5
相关论文
共 4 条
[1]
HAETT AV, 1939, P IRE, V27, P586
[2]
KAUFMAN HR, 1984, APPLICATIONS THEORY, P32
[3]
NOTE ON STABILITY OF ELECTRON FLOW IN THE PRESENCE OF POSITIVE IONS
PIERCE, JR
论文数:
0
引用数:
0
h-index:
0
PIERCE, JR
[J].
JOURNAL OF APPLIED PHYSICS,
1950,
21
(10)
: 1063
-
1063
[4]
GLOW-DISCHARGE-CREATED ELECTRON-BEAMS - CATHODE MATERIALS, ELECTRON-GUN DESIGNS, AND TECHNOLOGICAL APPLICATIONS
ROCCA, JJ
论文数:
0
引用数:
0
h-index:
0
ROCCA, JJ
MEYER, JD
论文数:
0
引用数:
0
h-index:
0
MEYER, JD
FARRELL, MR
论文数:
0
引用数:
0
h-index:
0
FARRELL, MR
COLLINS, GJ
论文数:
0
引用数:
0
h-index:
0
COLLINS, GJ
[J].
JOURNAL OF APPLIED PHYSICS,
1984,
56
(03)
: 790
-
797
←
1
→
共 4 条
[1]
HAETT AV, 1939, P IRE, V27, P586
[2]
KAUFMAN HR, 1984, APPLICATIONS THEORY, P32
[3]
NOTE ON STABILITY OF ELECTRON FLOW IN THE PRESENCE OF POSITIVE IONS
PIERCE, JR
论文数:
0
引用数:
0
h-index:
0
PIERCE, JR
[J].
JOURNAL OF APPLIED PHYSICS,
1950,
21
(10)
: 1063
-
1063
[4]
GLOW-DISCHARGE-CREATED ELECTRON-BEAMS - CATHODE MATERIALS, ELECTRON-GUN DESIGNS, AND TECHNOLOGICAL APPLICATIONS
ROCCA, JJ
论文数:
0
引用数:
0
h-index:
0
ROCCA, JJ
MEYER, JD
论文数:
0
引用数:
0
h-index:
0
MEYER, JD
FARRELL, MR
论文数:
0
引用数:
0
h-index:
0
FARRELL, MR
COLLINS, GJ
论文数:
0
引用数:
0
h-index:
0
COLLINS, GJ
[J].
JOURNAL OF APPLIED PHYSICS,
1984,
56
(03)
: 790
-
797
←
1
→