APPLICATION OF MAXIMUM-ENTROPY METHOD FOR DATA-PROCESSING OF MICROWAVE REFLECTOMETRY

被引：13

作者：

NAGATSU, M ^{[1
]}

HAYASHI, T ^{[1
]}

MATSUHISA, Y ^{[1
]}

TSUKISHIMA, T ^{[1
]}

机构：

[1] AICHI INST TECHNOL,DEPT ELECTR,AICHI 47003,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 1A期

关键词：

PLASMA DIAGNOSTIC; MICROWAVE REFLECTOMETRY; MAXIMUM ENTROPY METHOD SIMULTANEOUS REFLECTION; DENSITY PROFILE; HELICAL PLASMA;

D O I：

10.1143/JJAP.33.L45

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

One-dimensional full wave analysis shows that simultaneous reflections from the 0-mode and X-mode cutoff layers will occur through the mode-coupling process in a plasma with a sheared magnetic field. In this letter, we propose and examine signal processing using the maximum entropy method to overcome the problem caused by simultaneous reflection. It has been shown that the proposed method is effective for obtaining cutoff positions precisely not only in case of mixed, simultaneously-reflected signals but also in case of a noisy signal.

引用

页码：L45 / L47

页数：3

共 9 条

[1] MICROWAVE REFLECTOMETRY WITH THE EXTRAORDINARY MODE ON TOKAMAKS - DETERMINATION OF THE ELECTRON-DENSITY PROFILE OF PETULA-B [J].