CHARACTERIZATION OF OXYGEN-DOPED, PLASMA-DEPOSITED SILICON-NITRIDE

被引：29

作者：

KNOLLE, WR ^{[1
]}

OSENBACH, JW ^{[1
]}

ELIA, A ^{[1
]}

机构：

[1] ELECTROTECH,HAUPPAUGE,NY 11788

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 05期

关键词：

D O I：

10.1149/1.2095928

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1211 / 1217

页数：7

共 35 条

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